UltraTechnology Design Requirements
| Parameter | UltraBridge/UltraInductor Requirement |
| Base Conductor | WTi/Au |
| Base Conductor Thickness Å | 5,000 to 10,000 |
| Minimum Line (Base) mil (µm) | 0.4 (10) |
| Minimum Gap (Base) mil (µm) | 0.4 (10) |
| Dielectric | Si3N4 |
| Dielectric Constant | 6.0 |
| Dielectric Thickness Å | ~20,000 |
| Capacitance Density pF/mil2 | N/A |
| Dielectric Overlap of Base Conductor mil (µm) | 1.0 (25) min. |
| Dielectric Vias mil (µm) | 1.0 (25) min. |
| Dielectric Pads mil (µm) | 3.0 (75) min. |
| Top Conductor | To design |
| Top Conductor Thickness | 2x dielectric thickness |
| Capacitor Value Range pF | N/A |
| Capacitor Tolerance % | N/A |
| Capacitor Around Via | N/A |
| Minimum Line (Top Conductor) mil (µm) | 1.0 (25) |
| Minimum Gap (Top Conductor) mil (µm) | 0.5 (12) |
| Material | 99.6% Al2O3 & AlN* |
| Substrate Surface Finish | Polished |
| * Subject to Engineering Review mil = 0.001″ = .025mm = 25.4µm |
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| Parameter | UltraCapacitor Requirement |
| Base Conductor | WTi/Au |
| Base Conductor Thickness Å | 0.5x dielectric thickness |
| Minimum Line (Base) mil (µm) | N/A |
| Minimum Gap (Base) mil (µm) | N/A |
| Dielectric | Si3N4 |
| Dielectric Constant | 6.0 |
| Dielectric Thickness Å | ~5,000 to ~10,000 |
| Capacitance Density pF/mil2 | 0.035 to 0.07 |
| Dielectric Overlap of Base Conductor mil (µm) | 1.0 (25) min. |
| Dielectric Vias mil (µm) | N/A |
| Dielectric Pads mil (µm) | N/A |
| Top Conductor | To design |
| Top Conductor Thickness | 2x dielectric thickness |
| Capacitor Value Range pF | 2.250 |
| Capacitor Tolerance % | ±10 (50 pf) |
| Capacitor Around Via | Acceptable* |
| Minimum Line (Top Conductor) mil (µm) | N/A |
| Minimum Gap (Top Conductor) mil (µm) | N/A |
| Material | 99.6% Al2O3 / AlN* |
| Substrate Surface Finish | Polished |
| * Subject to Engineering Review mil = 0.001″ = .025mm = 25.4µm |
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