UltraTechnology Design Requirements
Parameter | UltraBridge/UltraInductor Requirement |
Base Conductor | WTi/Au |
Base Conductor Thickness Å | 5,000 to 10,000 |
Minimum Line (Base) mil (µm) | 0.4 (10) |
Minimum Gap (Base) mil (µm) | 0.4 (10) |
Dielectric | Si3N4 |
Dielectric Constant | 6.0 |
Dielectric Thickness Å | ~20,000 |
Capacitance Density pF/mil2 | N/A |
Dielectric Overlap of Base Conductor mil (µm) | 1.0 (25) min. |
Dielectric Vias mil (µm) | 1.0 (25) min. |
Dielectric Pads mil (µm) | 3.0 (75) min. |
Top Conductor | To design |
Top Conductor Thickness | 2x dielectric thickness |
Capacitor Value Range pF | N/A |
Capacitor Tolerance % | N/A |
Capacitor Around Via | N/A |
Minimum Line (Top Conductor) mil (µm) | 1.0 (25) |
Minimum Gap (Top Conductor) mil (µm) | 0.5 (12) |
Material | 99.6% Al2O3 & AlN* |
Substrate Surface Finish | Polished |
* Subject to Engineering Review mil = 0.001″ = .025mm = 25.4µm |
|
Parameter | UltraCapacitor Requirement |
Base Conductor | WTi/Au |
Base Conductor Thickness Å | 0.5x dielectric thickness |
Minimum Line (Base) mil (µm) | N/A |
Minimum Gap (Base) mil (µm) | N/A |
Dielectric | Si3N4 |
Dielectric Constant | 6.0 |
Dielectric Thickness Å | ~5,000 to ~10,000 |
Capacitance Density pF/mil2 | 0.035 to 0.07 |
Dielectric Overlap of Base Conductor mil (µm) | 1.0 (25) min. |
Dielectric Vias mil (µm) | N/A |
Dielectric Pads mil (µm) | N/A |
Top Conductor | To design |
Top Conductor Thickness | 2x dielectric thickness |
Capacitor Value Range pF | 2.250 |
Capacitor Tolerance % | ±10 (50 pf) |
Capacitor Around Via | Acceptable* |
Minimum Line (Top Conductor) mil (µm) | N/A |
Minimum Gap (Top Conductor) mil (µm) | N/A |
Material | 99.6% Al2O3 / AlN* |
Substrate Surface Finish | Polished |
* Subject to Engineering Review mil = 0.001″ = .025mm = 25.4µm |